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>ISO 14606:2022-Surface chemical analysis — Sputter depth profiling — Optimization using layered systems as reference materials
sklademVydáno: 2022
ISO 14606:2022-Surface chemical analysis — Sputter depth profiling — Optimization using layered systems as reference materials

ISO 14606:2022

ISO 14606:2022-Surface chemical analysis — Sputter depth profiling — Optimization using layered systems as reference materials

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Označení normy:ISO 14606:2022
Počet stran:17
Vydání:3
Vydáno:2022
Jazyk:Anglicky
DESCRIPTION

ISO 14606:2022


This document gives guidance and requirements on the optimization of sputter-depth profiling parameters using appropriate single-layered and multilayered reference materials, in order to achieve optimum depth resolution as a function of instrument settings in Auger electron spectroscopy, X-ray photoelectron spectroscopy and secondary ion mass spectrometry. This document is not intended to cover the use of special multilayered systems such as delta doped layers.