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Main page>ISO 14606 Surface chemical analysis — Sputter depth profiling — Optimization using layered systems as reference materials
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sklademVydáno: 2015
ISO 14606 Surface chemical analysis — Sputter depth profiling — Optimization using layered systems as reference materials

ISO 14606

Surface chemical analysis — Sputter depth profiling — Optimization using layered systems as reference materials

CURRENCY
99.34 €
Označení normy:ISO 14606
Počet stran:16
Vydání:2
Vydáno:2015
Jazyk:Anglicky
DESCRIPTION

ISO 14606


ISO 14606:2015 gives guidance on the optimization of sputter-depth profiling parameters using appropriate single-layered and multilayered reference materials in order to achieve optimum depth resolution as a function of instrument settings in Auger electron spectroscopy, X-ray photoelectron spectroscopy and secondary ion mass spectrometry. ISO 14606:2015 is not intended to cover the use of special multilayered systems such as delta doped layers.
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