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>ISO 19383:2026 - Atomic layer deposition — Chemical characteristics and related process specifications of atomic layer deposition precursors
sklademVydáno: 2026-06-01

ISO 19383:2026

ISO 19383:2026 - Atomic layer deposition — Chemical characteristics and related process specifications of atomic layer deposition precursors

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Označení normy:ISO 19383:2026
Vydání:1
Vydáno:2026-06-01
Počet stran (Anglicky):13
DESCRIPTION

ISO 19383:2026

This document defines the chemical characteristics and related process specifications of atomic layer deposition precursors, including assay content, metal purity and anion content specification.