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>ISO 23170:2022 - Surface chemical analysis — Depth profiling — Non-destructive depth profiling of nanoscale heavy metal oxide thin films on Si substrates with medium energy ion scattering
sklademVydáno: 2022-06-15
ISO 23170:2022 - Surface chemical analysis — Depth profiling — Non-destructive depth profiling of nanoscale heavy metal oxide thin films on Si substrates with medium energy ion scattering

ISO 23170:2022

ISO 23170:2022 - Surface chemical analysis — Depth profiling — Non-destructive depth profiling of nanoscale heavy metal oxide thin films on Si substrates with medium energy ion scattering

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Označení normy:ISO 23170:2022
Vydání:1
Vydáno:2022-06-15
Počet stran (Anglicky):29
DESCRIPTION

ISO 23170:2022

This document specifies a method for the quantitative depth profiling of amorphous heavy metal oxide ultrathin films on Si substrates using medium energy ion scattering (MEIS).

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