BS ISO 23812:2009

This standard BS ISO 23812:2009 Surface chemical analysis. Secondary-ion mass spectrometry. Method for depth calibration for silicon using multiple delta-layer reference materials is classified in these ICS categories:

• 71.040.40 Chemical analysis

1.1

This International Standard specifies a procedure for calibrating the depth scale in a shallow region, less than 50 nm deep, in SIMS depth profiling of silicon, using multiple delta-layer reference materials.

1.2 This International Standard is not applicable to the surface-transient region where the sputtering rate is not in the steady state.

1.3 This International Standard is applicable to single-crystalline silicon, polycrystalline silicon and amorphous silicon.