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sklademVydáno: 2022
ISO 14606:2022
ISO 14606:2022-Surface chemical analysis — Sputter depth profiling — Optimization using layered systems as reference materials
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| Označení normy: | ISO 14606:2022 |
| Počet stran: | 17 |
| Vydání: | 3 |
| Vydáno: | 2022 |
| Jazyk: | Anglicky |
Popis
ISO 14606:2022
This document gives guidance and requirements on the optimization of sputter-depth profiling parameters using appropriate single-layered and multilayered reference materials, in order to achieve optimum depth resolution as a function of instrument settings in Auger electron spectroscopy, X-ray photoelectron spectroscopy and secondary ion mass spectrometry. This document is not intended to cover the use of special multilayered systems such as delta doped layers.
